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Silicide Technology for Integrated Circuits
Silicide Technology for Integrated Circuits
Date: 28 April 2011, 06:01

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Silicide Technology for Integrated Circuits (Processing)
By Lih J. Chen
* Publisher: The Institution of Engineering and Technology
* Number Of Pages: 304
* Publication Date: 2004-12-17
* ISBN-10 / ASIN: 0863413528
* ISBN-13 / EAN: 9780863413520
Description
Scope: This is the first book to provide guidance on the development and application of metal silicide technology as it emerges from the scientific to the prototype and manufacturing stages. Other key topics covered are fundamentals, present and future silicide technology for Si-based devices, and characterisation methods.
About the Editor: Professor Chen is Dean at National Tsing Hua University, Taiwan.
Book readership
Suitable for engineers and students in microelectronics.
Level
Engineers and students.
Book contents
Silicides - An Introduction. Silicide Formation. Titanium Silicide Technology. Cobalt Silicide Technology. Nickel Silicide Technology. Light-Emitting Fe Disilicide. Silicide Contacts for Si-Ge Devices. Silicides Technology for SOI Devices. Characterization Methods.

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