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CVD of Compound Semiconductors: Precursor Synthesis, Development and Applications
CVD of Compound Semiconductors: Precursor Synthesis, Development and Applications
Date: 04 May 2011, 07:18

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Product Description
Chemical growth methods of electronic materials are the keystone of microelectronic device processing. This book discusses the applications of metalorganic chemistry for the vapor phase deposition of compound semiconductors. Vapor phase methods used for semiconductor deposition and the materials properties that make the organometallic precursors useful in the electronics industry are discussed for a variety of materials. Topics included: * techniques for compound semiconductor growth * metalorganic precursors for III-V MOVPE * metalorganic precursors for II-VI MOVPE * single-source precursors * chemical beam epitaxy * atomic layer epitaxy Several useful appendixes and a critically selected, up-to-date list of references round off this practical handbook for materials scientists, solid-state and organometallic chemists, and engineers.
From the Publisher
Chemical growth methods for electronic materials are the keystone of the microelectronics industry. This book discusses the applications of metalorganic chemistry for the vapor phase deposition of compound semiconductors. The work presents the vapor phase methods used for semiconductor deposition, the material properties of the various metalorganic precursors, the material properties of the final deposition, precursor design, operation parameters, and future trends. Several useful appendices and a critically selected, up-to-date list of references round off this particular handbook.
Product Details
* Hardcover: 360 pages
* Publisher: Wiley-VCH Verlag GmbH; 1 edition (May 1, 1997)
* Language: English
* ISBN-10: 3527292942
* ISBN-13: 978-3527292943

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