The Chemistry of Metal CVD - ISBN:3527290710

The Chemistry of Metal CVD

Date: 14 April 2011, 02:20

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Chemical Vapor Deposition (CVD) has developed rapidly in recent years as a method to produce metal films for a variety of applications in the electronics and coatings industries. Originally, it was thought that CVD of all materials was limited by incorporation of carbon and, as a result, the primary applications of CVD would be in the coatings industry where purity is often not a major concern. However, advances in CVD of semiconductors showed that films with purities meeting or exceeding all other deposition techniques and with abrupt interfaces can be created. Historically, the development of the CVD of metals has lagged behind CVD of compound semiconductors. However, because of the dramatic increase in effort in CVD of metals driven primarily by the microelectronics industry, this situation has improved and high-purity films of a wide variety of metals can now be deposited conformally at low temperatures. Success stories include CVD of tungsten and more recently of A1 and Cu films, which are now of sufficient quality to be suitable for applications in the microelectronics industry.

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